Novel microelectromechanical systems image reversal fabrication process based on robust SU-8 masking layers

Authors

• Scott A. Ostrow II, Air Force Institute of Technology
• Ronald A. Coutu Jr., Air Force Institute of Technology

Document Type

Article

Publication Date

7-1-2011

Abstract

Excerpt: This paper discusses a novel fabrication process that uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices.

Comments

© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

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DOI

10.1117/1.3625633

Source Publication

Journal of Micro/Nanolithography, MEMS, and MOEMS(ISSN 1932-5150)

Recommended Citation

Scott A. Ostrow II, Ronald A. Coutu Jr. "Novel microelectromechanical systems image reversal fabrication process based on robust SU-8 masking layers," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(3), 033016 (1 Jul 2011) https://doi.org/10.1117/1.3625633