Using positive photomasks to pattern SU-8 masking layers for fabricating inverse MEMS structures

Authors

• Scott Ostrow II, Air Force Institute of Technology
• Jack P. Lombardi III, Air Force Institute of Technology
• Ronald A. Coutu Jr., Air Force Institute of Technology

Document Type

Conference Proceeding

Publication Date

4-16-2011

Comments

Copyright © 2011 Society of Photo-Optical Instrumentation Engineers (SPIE).

The full conference paper is available from SPIE via subscription or purchase, using the DOI link below.

Event: SPIE Advanced Lithography, 2011, San Jose

DOI

10.1117/12.881653

Source Publication

Proceedings of SPIE, Volume 7972: Advances in Resist Materials and Processing Technology XXVIII

Recommended Citation

Scott A. Ostrow II, Jack P. Lombardi III, Ronald A. Coutu Jr. "Using positive photomasks to pattern SU-8 masking layers for fabricating inverse MEMS structures", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722J (16 Apr 2011); https://doi.org/10.1117/12.881653