How surface geometries can be selectively manipulated through nanosphere lithography (NSL) is discussed. Self-assembled monolayers and multilayers of nanospheres have been studied for decades and have been applied to lithography for almost as long. When compared to the most modern, state-of-the-art techniques, NSL offers comparable feature resolution with many advantages over competing technologies.
Journal of Micro/Nanolithography, MEMS, and MOEMS
T. V Laurvick et al., “Surface feature engineering through nanosphere lithography,” J. Micro/Nanolithography, MEMS, MOEMS 15(3), SPIE (2016) [doi:10.1117/1.JMM.15.3.031602].