Document Type

Article

Publication Date

8-17-2016

Abstract

How surface geometries can be selectively manipulated through nanosphere lithography (NSL) is discussed. Self-assembled monolayers and multilayers of nanospheres have been studied for decades and have been applied to lithography for almost as long. When compared to the most modern, state-of-the-art techniques, NSL offers comparable feature resolution with many advantages over competing technologies.

Comments

Publisher version of record at SPIE: https://doi.org/10.1117/1.JMM.15.3.031602

Found as: T. V Laurvick et al., “Surface feature engineering through nanosphere lithography,” J. Micro/Nanolithography, MEMS, MOEMS 15(3), SPIE (2016) [doi:10.1117/1.JMM.15.3.031602].

© The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI. CC BY 3.0 (http://creativecommons.org/licenses/by/3.0/)

DOI

10.1117/1.JMM.15.3.031602

Source Publication

Journal of Micro/Nanolithography, MEMS, and MOEMS

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