Document Type

Article

Publication Date

8-17-2016

Abstract

How surface geometries can be selectively manipulated through nanosphere lithography (NSL) is discussed. Self-assembled monolayers and multilayers of nanospheres have been studied for decades and have been applied to lithography for almost as long. When compared to the most modern, state-of-the-art techniques, NSL offers comparable feature resolution with many advantages over competing technologies.

Comments

© The Authors. This is an open access article published by SPIE, and distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. CC BY 3.0

Sourced from the published version of record cited below.

DOI

10.1117/1.JMM.15.3.031602

Source Publication

Journal of Micro/Nanolithography, MEMS, and MOEMS

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