How surface geometries can be selectively manipulated through nanosphere lithography (NSL) is discussed. Self-assembled monolayers and multilayers of nanospheres have been studied for decades and have been applied to lithography for almost as long. When compared to the most modern, state-of-the-art techniques, NSL offers comparable feature resolution with many advantages over competing technologies.
Journal of Micro/Nanolithography, MEMS, and MOEMS
Laurvick, Tod V.; Coutu, Ronald A. Jr.; Sattler, James M.; and Lake, Robert A., "Surface Feature Engineering through Nanosphere Lithography" (2016). Faculty Publications. 94.