Surface Feature Engineering through Nanosphere Lithography

Authors

Tod V. Laurvick, Air Force Institute of TechnologyFollow
Ronald A. Coutu Jr., Air Force Institute of Technology
James M. Sattler, Air Force Institute of Technology
Robert A. Lake, Air Force Institute of Technology

Document Type

Article

Publication Date

8-17-2016

Abstract

How surface geometries can be selectively manipulated through nanosphere lithography (NSL) is discussed. Self-assembled monolayers and multilayers of nanospheres have been studied for decades and have been applied to lithography for almost as long. When compared to the most modern, state-of-the-art techniques, NSL offers comparable feature resolution with many advantages over competing technologies.

Comments

© The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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DOI

10.1117/1.JMM.15.3.031602

Source Publication

Journal of Micro/Nanolithography, MEMS, and MOEMS

Recommended Citation

T. V Laurvick et al., “Surface feature engineering through nanosphere lithography,” J. Micro/Nanolithography, MEMS, MOEMS 15(3), SPIE (2016) [doi:10.1117/1.JMM.15.3.031602].