Tunneling atomic force microscopy characterization of cuprous oxide thin films
Document Type
Conference Proceeding
Publication Date
8-15-2011
Source Publication
Nanotechnology (IEEE-NANO), 2011 11th IEEE Conference on
Recommended Citation
B. Castle, A. Li, R. Coutu, R. Hengehold and J. Van Nostrand, "Tunneling atomic force microscopy characterization of cuprous oxide thin films," 2011 11th IEEE International Conference on Nanotechnology, Portland, OR, USA, 2011, pp. 1470-1473, doi: 10.1109/NANO.2011.6144415.
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Comments
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