Computational Characterization of Ion Beam Uniformity of Planar Pinched-Beam Ion Diodes
Document Type
Article
Publication Date
12-5-2025
Abstract
This work presents a particle-in-cell (PIC) simulation-based analysis of ion-beam uniformity from planar diodes. Diode configurations with variations in anode geometry, thickness, and material were explored, including round, tapered, and monolithic polyethylene and Mylar designs. The ion fluence and current enclosed profiles were extracted to assess the quality of the beam across the anode surface. The results show that dual-anode planar geometries produce promising ion beam uniformities, with the most uniform case yielding a coefficient of variation of 10.62%. Round-edge designs mitigate magnetic field losses at anode tips, while thinner anodes enhance ion production through increased electron reflexing. These findings support the use of planar diodes in high-uniformity ion beam environments for materials testing applications.
Source Publication
IEEE Transactions on Plasma Science (ISSN 0093-3813 | eISSN 1939-9375)
Recommended Citation
A. K. Tichy, J. C. Foster, S. B. Swanekamp and P. F. Ottinger, "Computational Characterization of Ion Beam Uniformity of Planar Pinched-Beam Ion Diodes," in IEEE Transactions on Plasma Science, doi: 10.1109/TPS.2025.3635056.
Comments
This article was published online by IEEE in December 2025 ahead of inclusion in an issue of IEEE Transactions on Plasma Science.