Self-assembling nanosphere lithography process for gated carbon nanotube field emission arrays

Authors

Benjamin L. Crossley, Air Force Institute of Technology
Ronald A. Coutu Jr., Air Force Institute of Technology
LaVern A. Starman, Air Force Institute of Technology
Peter J. Collins, Air Force Institute of Technology

Document Type

Conference Proceeding

Publication Date

4-1-2010

Comments

Copyright © 2010 Society of Photo-Optical Instrumentation Engineers (SPIE).

Co-author B. Crossley was enrolled in an AFIT PhD program at the time of this conference. (AFIT-DCE-ENG-11-03, June 2011)

Event: SPIE Advanced Lithography, 2010, San Jose, California

DOI

10.1117/12.846626

Source Publication

Proceedings of SPIE, Volume 7637: Alternative Lithographic Technologies II

Recommended Citation

Benjamin L. Crossley, Ronald A. Coutu Jr., LaVern A. Starman, and Peter J. Collins "Self-assembling nanosphere lithography process for gated carbon nanotube field emission arrays", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370O (1 April 2010); https://doi.org/10.1117/12.846626