"Isolating the negative stiffness region of a buckled Si/SiO<sub>2</sub" by Kyle K. Ziegler, Robert A. Lake et al. 10.1117/12.2037383">
 

Isolating the negative stiffness region of a buckled Si/SiO2 membrane

Document Type

Conference Proceeding

Publication Date

3-7-2014

Comments

Copyright © 2014 Society of Photo-Optical Instrumentation Engineers (SPIE).

This conference paper is published by SPIE and is accessible by subscription or purchase using the DOI link on this page.

Author notes:

Kyle Ziegler was completing his M.S. in Electrical Engineering at AFIT at the time of this conference. (AFIT-ENG-14-M-88, March 2014)

Robert Lake was an AFIT PhD student at the time of this conference. (AFIT-ENG-DS-15-S-013, September 2015)

Plain-text title form: Isolating the negative stiffness region of a buckled Si/SiO 2 membrane

Source Publication

Micromachining and Microfabrication Process Technology XIX

This document is currently not available here.

Share

COinS