Improved grayscale lithography

Authors

Tod V. Laurvick, Air Force Institute of Technology
Ronald A. Coutu Jr., Air Force Institute of Technology

Document Type

Conference Proceeding

Publication Date

7-25-2016

Comments

Copyright © 2016, IEEE.

This conference paper is available through subscription or purchase from the publisher, IEEE, using the DOI link below.

DOI

10.1109/NAECON.2016.7856824

Source Publication

Proceedings of the IEEE National Aerospace Electronics Conference, NAECON

Recommended Citation

T. Laurvick and R. A. Coutu, "Improved grayscale lithography," 2016 IEEE National Aerospace and Electronics Conference (NAECON) and Ohio Innovation Summit (OIS), Dayton, OH, USA, 2016, pp. 328-332, doi: 10.1109/NAECON.2016.7856824.