Simulation and modeling of fabricated metasurface optical device measured via polarimetric scatterometer

Authors

Carlos D. Diaz, Air Force Institute of Technology
David B. Burckel, Sandia National Laboratories
Bryan M. Adomanis, Air Force Institute of Technology
Augustine M. Urbas, Air Force Research Laboratory
Michael A. Marciniak, Air Force Institute of TechnologyFollow
James A. Ethridge, Air Force Institute of Technology

Document Type

Conference Proceeding

Publication Date

8-21-2020

Comments

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE). The full text of this conference paper is available via subscription or purchase through the DOI link on this page.

Co-author Carlos Diaz was an AFIT PhD candidate at the time of this conference. (AFIT-ENP-DS-21-M-112, March 2021)

DOI

10.1117/12.2568200

Source Publication

Proceedings of SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII

Recommended Citation

Carlos D. Diaz, D. Bruce Burckel, Bryan Adomanis, Augustine M. Urbas, and Michael A. Marciniak "Simulation and modeling of fabricated metasurface optical device measured via polarimetric scatterometer", Proc. SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII, 114670J (21 August 2020); https://doi.org/10.1117/12.2568200