Abstract
A wafer scale integration arrangement wherein integrated circuit die of varying size, fabrication processes, and function are commonly mounted in the same host wafer using a filled epoxy material of special characteristics. The mounting epoxy material also serves as a substrate for the die interconnecting conductors in regions adjacent the mounted die. The described assembly also includes a newly available photosensitive polyimide material as a planarization and passivation covering for the die and host wafer and as a mounting surface for an interconnecting metal conductor array. Multiple levels of interconnection metal. Fabrication processes for the die to host wafer attachment and the passivation covering of the assembly are disclosed.
Document Type
Patent
Status
Issued
Issue Date
1-29-1991
Patent Number
US 4989063 A [ 4,989,063 ]
CPC Classification
H 01 L 24/29
Application number
07/549672
Assignees
The United States of America as represented by the Secretary of the Air Force
Filing Date
4-24-1990
Recommended Citation
Kolesar, Edward S. Hybrid Wafer Scale Microcircuit Integration. United States Patent 4989063, issued 29 Jan 1991.