Date of Award
3-26-2015
Document Type
Thesis
Degree Name
Master of Science
Department
Department of Engineering Physics
First Advisor
James C. Petrosky, PhD.
Abstract
The radiation response of 14nm h-BN/Si metal insulator semiconductor (MIS) devices was investigated using current-voltage and capacitance-voltage measurements indicating Frenkel Poole (FP) and Fowler-Nordheim tunneling (FNT) are the primary current mechanisms before and after irradiation. The data were fit to a composite model of FP and FNT currents. Irradiations to 33.1, 99.3, and 331 krad(Si) from a cobalt-60 source causes a negative voltage shift to the current-voltage measurements of -0.14, -0.45, and -0.46 V respectively. The negative shift indicates radiation induced production of positive space charge at the h-BN/Si interface. No device characteristic changes were observed following gamma irradiation. Fitting the model to data collected after neutron irradiation at affluence of 3.76x1015 n/cm2 indicated no change in the barrier potential for the linear FNT model and a 0.013 eV increase in the barrier potential for the FP model. There was a decrease of 0.19 eV in the tunneling potential for the non-linear FNT model. Defects generated by the neutron damage increased currents by increasing trap assisted tunneling (TAT).
AFIT Designator
AFIT-ENP-MS-15-M-099
DTIC Accession Number
ADA614965
Recommended Citation
Barnett, Brian L., "Ionizing and Non-ionizing Radiation Effects in Thin Layer Hexagonal Boron Nitride" (2015). Theses and Dissertations. 75.
https://scholar.afit.edu/etd/75