Date of Award
12-1992
Document Type
Thesis
Degree Name
Master of Science
Department
Department of Engineering Physics
First Advisor
William F. Bailey, PhD
Abstract
For many applications such as lasers and radar drive circuits, there exists a need for solid state high voltage, high current switches. Current gaseous discharge switches fail to satisfy the ruggedness, reliability, and lifetime requirements of today's systems. A promising alternative is the Photoconductive Semiconductor Switch (PCSS). The limiting factor in the operation of these switches is the occurrence of breakdown through channels formed slightly below the surface. A theory on the formation of these channels is presented based upon band bending at the metal-semiconductor interface, a nonhomogeneous space charge due to irregular trap distributions, and thermal runaway in localized regions. Experimental results on the effect of thin oxide layers and boron doping at the metal-semiconductor junctions reveal that the junctions play a very important role in the breakdown of the samples, changing the breakdown potential by almost a factor of three. By placing a thin oxide layer at the anode face of a sample, an excellent photoconductive switch can be produced. The resistance of this switch was changed by three orders of magnitude through optical illumination.
AFIT Designator
AFIT-GEP-ENP-92D-5
DTIC Accession Number
ADA259171
Recommended Citation
Hibbeln, Brian A., "The Effect of Oxide Layers and Boron Doping on the Breakdown of High Purity Silicon" (1992). Theses and Dissertations. 7185.
https://scholar.afit.edu/etd/7185
Comments
The author's Vita page is omitted.