Date of Award
Master of Science in Electrical Engineering
Department of Electrical and Computer Engineering
Tod Laurvik, PhD
Micromirror devices which consisted of one SU-8 2050 layer, two different exposures, and a series of metal depositions were constructed and evaluated. By varying the exposure, a micromirror structure was fabricated with different thicknesses, a ratio of 1.083 µm/(mJ/cm2) was found. The initial design consisted of four layers. The pillar was made of one SU-8 layer, and the top portion had three layers in the following order: gold, SU-8, and gold. This design could not be released and did not have characteristics of a flat and conformal reflective surface. Several variations of the initial design were explored and all of them lacked a flat and conformal top reflective surface. Both interferometric and statistical software showed that using a 60 mJ/cm2 mirror exposure dosage and a 370 mJ/cm2 square pillar exposure dosage yields a micromirror with a conformal top reflective surface. The length and width of the pillars are 200µm by 200µm, with a height of 75 µm. The mirror’s length and width are 1 mm by 1 mm, and the thickness is 65 µm. The average step height difference from the pillar to the side of the mirror, pillar to each corner of the mirror, and pillar to initial dip in the mirror is 4.53, 9.22, and 1.51 µm, respectively.
DTIC Accession Number
Flores, Enoc, "Improved Fabrication for Micromirror Arrays" (2019). Theses and Dissertations. 2257.