Date of Award
Master of Science
Department of Electrical and Computer Engineering
Michael A. Marciniak, PhD.
The goal of this work is to develop unique holograms on a semiconductor-metal thin films to characterize as potential metamaterials. This is achievable by developing a fabrication recipe to include exposure methods, exposure dosages, and material development. This study developed an interference lithography capability at AFIT for the first time with period resolution below 230nm. It also identified initial acceptable photoresist materials and exposure dosages, and a path to follow to optimize this process. The potential impact of this is to make IL a standard in optical meta-material fabrication, which decreases manufacturing time and allows for less error in production. These aspects support a variety of Air Force applications, including high efficiency solar cells and spacecraft thermal management.
DTIC Accession Number
Crozier, Stanley D., "Development of an interference lithography capability using a helium cadmium ultraviolet multimode laser for the fabrication of sub-micron-structured optical materials" (2011). Theses and Dissertations. 1376.